|
|
|
|
LEADER |
01871nmm a2200457 u 4500 |
001 |
EB002165161 |
003 |
EBX01000000000000001302940 |
005 |
00000000000000.0 |
007 |
cr||||||||||||||||||||| |
008 |
230607 ||| eng |
020 |
|
|
|a 9780841210400
|
050 |
|
4 |
|a TR940
|
100 |
1 |
|
|a Thompson, L. F.
|e [editor]
|
245 |
0 |
0 |
|a Introduction to microlithography
|b theory, materials, and processing
|c L.F. Thompson, editor, C.G. Willson, editor, M.J. Bowden, editor ; based on a workshop sponsored by the ACS Division of Organic Coatings and Plastics Chemistry at the 185th Meeting of the American Chemical Society, Seattle, Washington, March 20-25, 1983
|
260 |
|
|
|a Washington, DC
|b American Chemical Society
|c 1983, 1983
|
300 |
|
|
|a 380 pages
|b illustrations
|
505 |
0 |
|
|a Includes bibliographical references and index
|
653 |
|
|
|a TECHNOLOGY & ENGINEERING / Electronics / Microelectronics / bisacsh
|
653 |
|
|
|a Photoresists
|
653 |
|
|
|a Semiconductors
|
653 |
|
|
|a Plasma etching
|
653 |
|
|
|a Physical Phenomena
|
653 |
|
|
|a Lithography / Research
|
653 |
|
|
|a Photolithography
|
653 |
|
|
|a Transistors, Electronic
|
653 |
|
|
|a Miniaturization
|
653 |
|
|
|a Microlithography
|
653 |
|
|
|a Chemical Phenomena
|
653 |
|
|
|a Semiconductors / Etching
|
653 |
|
|
|a Printing
|
653 |
|
|
|a Electronics
|
700 |
1 |
|
|a Willson, C. G.
|e [editor]
|
700 |
1 |
|
|a Bowden, M. J.
|e [editor]
|
710 |
2 |
|
|a American Chemical Society
|b Division of Organic Coating and Plastics Chemistry
|
710 |
2 |
|
|a American Chemical Society
|b Meeting ( 1983, Seattle, Washington)
|
041 |
0 |
7 |
|a eng
|2 ISO 639-2
|
989 |
|
|
|b ACS
|a ACS Symposium Series
|
490 |
0 |
|
|a ACS symposium series
|
500 |
|
|
|a Distributed in print by Oxford University Press
|
856 |
4 |
0 |
|u https://pubs.acs.org/doi/book/10.1021/bk-1983-0219
|x Verlag
|3 Volltext
|
082 |
0 |
|
|a 621.3815/31
|