Computational lithography
A Unified Summary of the Models and Optimization Methods Used in Computational Lithography. Optical lithography is one of the most challenging areas of current integrated circuit manufacturing technology. The semiconductor industry is relying more on resolution enhancement techniques (RETs), since t...
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| Format: | eBook |
| Language: | English |
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Hoboken, N.J.
Wiley
2010
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| Series: | Wiley series in pure and applied optics
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| Collection: | O'Reilly - Collection details see MPG.ReNa |
| Summary: | A Unified Summary of the Models and Optimization Methods Used in Computational Lithography. Optical lithography is one of the most challenging areas of current integrated circuit manufacturing technology. The semiconductor industry is relying more on resolution enhancement techniques (RETs), since their implementation does not require significant changes in fabrication infrastructure. Computational Lithography is the first book to address the computational optimization of RETs in optical lithography, providing an in-depth discussion of optimal optical proximity correction (OPC), phase shifting |
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| Physical Description: | xv, 226 pages illustrations |
| ISBN: | 9780470618943 9781118043578 0470618949 9780470596975 047059697X 9780470618936 0470618930 |