Computational lithography
A Unified Summary of the Models and Optimization Methods Used in Computational Lithography. Optical lithography is one of the most challenging areas of current integrated circuit manufacturing technology. The semiconductor industry is relying more on resolution enhancement techniques (RETs), since t...
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| Format: | eBook |
| Language: | English |
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Hoboken, N.J.
Wiley
2010
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| Series: | Wiley series in pure and applied optics
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| Online Access: | |
| Collection: | O'Reilly - Collection details see MPG.ReNa |
Table of Contents:
- Includes bibliographical references and index
- Optical Lithography Systems
- Rule-Based Resolution Enhancement Techniques
- Fundamentals of Optimization
- Computational Lithography with Coherent Illumination
- Regularization Framework
- Computational Lithography with Partially Coherent Illumination
- Other RET Optimization Techniques
- Source and Mask Optimization
- Coherent Thick-Mask Optimization
- Conclusions and New Directions of Computational Lithography
- Appendix A: Formula Derivation in Chapter 5
- Appendix B: Manhattan Geometry
- Appendix C: Formula Derivation in Chapter 6
- Appendix D: Formula Derivation in Chapter 7
- Appendix E: Formula Derivation in Chapter 8
- Appendix F: Formula Derivation in Chapter 9
- Appendix G: Formula Derivation in Chapter 10
- Appendix H: Software Guide