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1
Published 2004
Springer Berlin Heidelberg
...This volume is a comprehensive review of CMP (Chemical-Mechanical Planarization) technology, which...

2
by Paik, Ungyu
Published 2009
Taylor & Francis
... the physicochemical properties of nanoparticles according to each step in the chemical mechanical planarization (CMP...

3
Published 1991
Springer US

4
by Celano, Umberto
Published 2016
Springer International Publishing

7
Published 1996
Springer Berlin Heidelberg

9 Table of Contents: ... -- 2.6 Nanoporous Silica Films -- 2.7 Other Porous Materials -- 2.8 References -- 3: Chemical-Mechanical...

11
Published 2014
Springer International Publishing
... piezoelectric techniques and also latest achievements in materials science, condensed matter physics, mechanics...

12
by Cheng, Jie
Published 2018
Springer Nature Singapore
...This thesis addresses selected unsolved problems in the chemical mechanical polishing process (CMP...

14
Published 2017
Springer International Publishing
... July, 2016). The Proceedings are devoted to processing techniques, physics, mechanics, and applications...

15
Published 2016
Springer International Publishing
... techniques, physics, mechanics, and applications of advanced materials. The book is concentrated on some...

16
Published 2007
Springer US
Table of Contents: ... Systems -- Thin Films for Microelectronics and Photonics: Physics, Mechanics, Characterization...

17
by Ouyang, Jian
Published 2020
Frontiers Media SA
Subjects: ...Chemical and physical mechanisms...

18
by Hummelberger, David
Published 2019
KIT Scientific Publishing
Subjects: ...Physical mechanisms...