Growth of High Permittivity Dielectrics by High Pressure Sputtering from Metallic Targets
This thesis describes the fabrication of metal-insulator-semiconductor (MIS) structures using very high permittivity dielectrics (based on rare earths) grown by high-pressure sputtering from metallic targets. It demonstrates the possibility of depositing high permittivity materials (GdScO3) by means...
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| Format: | eBook |
| Language: | English |
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Cham
Springer International Publishing
2017, 2017
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| Edition: | 1st ed. 2017 |
| Series: | Springer Theses, Recognizing Outstanding Ph.D. Research
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| Collection: | Springer eBooks 2005- - Collection details see MPG.ReNa |
Table of Contents:
- Introduction
- Fabrication Techniques
- Characterization Techniques
- Thermal Oxidation of Gd2o3
- Plasma Oxidation of Gd2o3 and Sc2o3
- Gadolinium Scandate
- Interface Scavenging
- Gd2o3 on Inp Substrates
- Conclusions and Future Work