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140203 ||| eng |
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|a 9783642540073
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| 100 |
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|a Ji, Liangliang
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| 245 |
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|a Ion acceleration and extreme light field generation based on ultra-short and ultra–intense lasers
|h Elektronische Ressource
|c by Liangliang Ji
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| 250 |
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|a 1st ed. 2014
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| 260 |
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|a Berlin, Heidelberg
|b Springer Berlin Heidelberg
|c 2014, 2014
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| 300 |
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|a XII, 84 p. 46 illus., 16 illus. in color
|b online resource
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| 505 |
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|a Introduction -- Ion acceleration I: Efficient heavy ion acceleration by ESA.- Ion acceleration II: The critical target thickness in light sail acceleration -- Extreme light field generation I: Quasi-single-cycle relativistic laser pulse -- Extreme light field generation II: Short-wavelength single-cycle ultra-intense laser pulse -- Extreme light field generation III: Ultra-intense isolated attosecond pulse -- Summary
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| 653 |
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|a Atoms
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| 653 |
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|a Laser
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| 653 |
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|a Plasma Physics
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| 653 |
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|a Lasers
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| 653 |
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|a Atoms and molecules in external fields
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| 653 |
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|a Particle accelerators
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| 653 |
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|a Plasma (Ionized gases)
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| 653 |
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|a Accelerator Physics
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| 653 |
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|a Molecules
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| 041 |
0 |
7 |
|a eng
|2 ISO 639-2
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| 989 |
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|b Springer
|a Springer eBooks 2005-
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| 490 |
0 |
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|a Springer Theses, Recognizing Outstanding Ph.D. Research
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| 028 |
5 |
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|a 10.1007/978-3-642-54007-3
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| 856 |
4 |
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|u https://doi.org/10.1007/978-3-642-54007-3?nosfx=y
|x Verlag
|3 Volltext
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| 082 |
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|a 539
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| 520 |
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|a This book is dedicated to the relativistic (laser intensity above 1018 W/cm2) laser-plasma interactions, which mainly concerns two important aspects: ion acceleration and extreme-light-field (ELF). Based on the ultra-intense and ultra-short CP lasers, this book proposes a new method that significantly improves the efficiency of heavy-ion acceleration, and deals with the critical thickness issues of light pressure acceleration. More importantly, a series of plasma approaches for producing ELFs, such as the relativistic single-cycle laser pulse, the intense broad-spectrum chirped laser pulse and the ultra-intense isolated attosecond (10-18s) pulse are introduced. This book illustrates that plasma not only affords a tremendous accelerating gradient for ion acceleration but also serves as a novel medium for ELF generation, and hence has the potential of plasma-based optics, which have a great advantage on the light intensity due to the absence of device damage threshold
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