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140122 ||| eng |
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|a 9783709189610
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| 100 |
1 |
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|a Riedling, Karl
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| 245 |
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0 |
|a Ellipsometry for Industrial Applications
|h Elektronische Ressource
|c by Karl Riedling
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| 250 |
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|a 1st ed. 1988
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| 260 |
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|a Vienna
|b Springer Vienna
|c 1988, 1988
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| 300 |
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|a XIII, 99 p. 49 illus
|b online resource
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| 505 |
0 |
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|a 1. Basics of Ellipsometry -- 1.1 Physics -- 1.2 Instrumentation -- 2. Ellipsometry in Microelectronic Technology -- 2.1 Semiconductor Substrates and Films -- 2.2 Insulating Films -- 2.3 Etching Processes -- 3. Error Effects in Ellipsometric Investigations -- 3.1 Random Measurement Errors -- 3.2 Instrumentation Error Effects -- 3.3 Effects of the Sample Structure -- Appendix A: Design Considerations for a High-Speed Rotating -- Analyzer Ellipsometer -- Al The Optical Assembly -- A2 Electronic Interface Circuitry -- A3 The Microcomputer System -- A3.1 Hardware -- A3.2 Software -- References
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| 653 |
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|a Materials—Surfaces
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| 653 |
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|a Spectroscopy and Microscopy
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| 653 |
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|a Thin films
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| 653 |
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|a Spectroscopy
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| 653 |
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|a Surfaces and Interfaces, Thin Films
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| 653 |
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|a Electronic materials
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| 653 |
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|a Solid State Physics
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| 653 |
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|a Photonics
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| 653 |
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|a Electronics and Microelectronics, Instrumentation
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| 653 |
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|a Lasers
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| 653 |
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|a Optics, Lasers, Photonics, Optical Devices
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| 653 |
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|a Electronics
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| 653 |
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|a Optical materials
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| 653 |
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|a Microscopy
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| 653 |
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|a Optical and Electronic Materials
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| 653 |
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|a Microelectronics
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| 653 |
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|a Solid state physics
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| 041 |
0 |
7 |
|a eng
|2 ISO 639-2
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| 989 |
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|b SBA
|a Springer Book Archives -2004
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| 856 |
4 |
0 |
|u https://doi.org/10.1007/978-3-7091-8961-0?nosfx=y
|x Verlag
|3 Volltext
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| 082 |
0 |
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|a 530.41
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| 520 |
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|a During the past years, elliposometry, a non-destructive and contact-less optical surface analysis technique, has gained increased importance in industrial areas, such as the technology of electronic devices, when simple instruments, many of them computer-controlled and automated, became available. The potential users of such instruments are, however, frequently aware neither of the inherent possibilities of this technique, nor of its accuracy limitations. This book endeavors to point out some of the less obvious features and possibilities of ellipsometry, particularly of dynamic "in situ" measurements, and reviews its applications in research and manufacturing of semiconductor and thin film devices. A comprehensive discussion of various error effects typical particularly for simple ellipsometers and of their impact on measured sample parameters is provided. Error correction or (numerical) calibration procedures are given wherever possible, and design and operation guidelines for high-speed instruments suitable for dynamic "in situ" measurements are suggested
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