Progress in Materials Analysis Vol. 2
Vol. 2 of "Progress in Materials Analysis" contains the lectures of the 12th Colloquium on Materials Analysis, Vienna, May 13-15, 1985. Due to the top level international participation from industry and research insti tutions the proceedings offer a survey of the present state and current...
| Other Authors: | , |
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| Format: | eBook |
| Language: | English |
| Published: |
Vienna
Springer Vienna
1985, 1985
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| Edition: | 1st ed. 1985 |
| Series: | Mikrochimica Acta Supplementa
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| Subjects: | |
| Online Access: | |
| Collection: | Springer Book Archives -2004 - Collection details see MPG.ReNa |
Table of Contents:
- Electron Probe Microanalysis of Oxygen and Determination of Oxide Film Thickness Using Gaussian ?(?z) Curves
- Procedures to Optimize the Measuring Methods in the Electron Probe Microanalysis of Low Energy X-Rays
- Quantitative Microstructural Analysis of Sintered Silicon Nitride by Using a Thin-Window Energy Dispersive X-Ray Detector System
- Optimizing the Microstructure of Implant Alloy TiA15Fe2.5 by Microprobe Analysis
- Characterization of Technical Surfaces With a Coupled SEM-EDA-Image Analyzer System
- Microanalytical Characterization of a Powder Metallurgical Ledeburitic Tool Steel by Transmission Electron Microscopy
- Determination of the Bonding Behaviour of Carbon and Nitrogen in Micro-Alloyed Structural Steels
- Analytical Electron Microscopy of Rare-Earth Permanent Magnet Materials
- Internal Quantification of Glow Discharge Optical Spectroscopy-Depth Profiles of Oxide and Nitride Layers on Metals
- Element Profiling by Secondary Ion Mass Spectrometry of Surface Layers in Glasses
- Neutral Primary Beam Secondary Ion Mass Spectrometry Analysis of Corrosion Phenomena on Glass Surfaces
- Quantitative Distribution Analysis of Phosphorus in Silicon with Secondary Ion Mass Spectrometry
- Positron Studies of Defects in Metals and Semiconductor
- Kossel Technique and Positron Annihilation Used to Clarify Sintering Processes
- Selection and Qualification Tests of High Temperature Materials by Special Microanalytical Methods
- On the Application of Acoustic Emission Analysis to Evaluate the Integrity of Protective Coatings t on High-Temperature Alloys
- Microprobe Measurements to Determine the Melt Equilibria of High-Alloy Nickel Materials
- Experimental Determination of the Depth Distribution of X-Ray Production ?(?z) for X-Ray Energies Below 1 keV
- Surface Characterization of Thin Organic Films on Metals
- Analysis of Very Thin Organic Fibres by Means of Small Spots Electron Spectroscopy for Chemical Analysis
- Ion Implantation in the Surface Analysis of Solid Materials
- Comparison of Ion Implantation Profiles Obtained by AES/Sputtering Measurements and Monte Carlo Calculations
- Microfocussed Ion Beams for Surface Analysis and Depth Profiling
- Secondary Neutral Mass Spectrometry Depth Profile Analysis of Silicides
- Analysis of Thin Chromate Layers on Aluminium. I. Opportunities and Limitations of Surface Analytical Methods
- Analysis of Thin Chromate Layers on Aluminium. II. Structure and Composition of No-rinse Conversion Layers
- Surface Analytical Investigation of the Corrosion Behaviour of Ti(Pd) Samples
- Determination of the Lubricant Thickness Distribution on Magnetic Disks by Means of X-Ray Induced Volatilization and Simultaneous Photoelectron Spectroscopy