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Rapid Thermal Processing of Semiconductors

Rapid thermal processing has contributed to the development of single wafer cluster processing tools and other innovations in integrated circuit manufacturing environments. Borisenko and Hesketh review theoretical and experimental progress in the field, discussing a wide range of materials, processe...

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Bibliographic Details
Main Authors: Borisenko, Victor E., Hesketh, Peter J. (Author)
Format: eBook
Language:English
Published: New York, NY Springer US 1997, 1997
Edition:1st ed. 1997
Series:Microdevices, Physics and Fabrication Technologies
Subjects:
Spectrum Analysis
Condensed Matter Physics
Spectroscopy
Optical Materials
Condensed Matter
Online Access:
Collection: Springer Book Archives -2004 - Collection details see MPG.ReNa
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505 0 |a 1. Transient Heating of Semiconductors by Radiation -- 2. Recrystallization of Implanted Layers and Impurity Behavior in Silicon Crystals -- 3. Crystallization, Impurity Diffusion, and Segregation in Polycrystalline Silicon -- 4. Component Evaporation, Defect Annealing, and Impurity Diffusion in the III–V Semiconductors -- 5. Diffusion Synthesis of Silicides in Thin-Film Metal—Silicon Structures -- 6. Rapid Thermal Oxidation and Nitridation -- 7. Rapid Thermal Chemical Vapor Deposition -- References 
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520 |a Rapid thermal processing has contributed to the development of single wafer cluster processing tools and other innovations in integrated circuit manufacturing environments. Borisenko and Hesketh review theoretical and experimental progress in the field, discussing a wide range of materials, processes, and conditions. They thoroughly cover the work of international investigators in the field 

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