Particles on Surfaces 1 Detection, Adhesion, and Removal
This volume chronicles the proceedings of the Symposium on Particles on Surfaces: Detection, Adhesion and Removal held under the auspices of the Fine Particle Society in San Francisco, July 28-August 2, 1986. The study of particles on surfaces is extremely important in many areas of human endeavor (...
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Format: | eBook |
Language: | English |
Published: |
New York, NY
Springer US
1988, 1988
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Edition: | 1st ed. 1988 |
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Online Access: | |
Collection: | Springer Book Archives -2004 - Collection details see MPG.ReNa |
Table of Contents:
- IV. Particle Removal
- Methods for Surface Particle Removal: A Comparative Study
- Electrostatic Removal of Particles from Surfaces
- Electric Field Detachment of Charged Particles
- A New Approach to the Removal of Sub-Micron Particles From Solid (Silicon) Substrates
- About the Contributors
- I. General Papers
- Fine Particles on Semiconductor Surfaces: Sources, Removal and Impact on the Semiconductor Industry
- Cleaning Semiconductor Surfaces: Facts and Foibles
- Effect of Chemical Cleaning Sequencing on Particle Addition/Reduction on Silicon Wafers
- Measuring Aerosol Particle Concentration in Clean Rooms and Particle Areal Density on Silicon Wafer Surfaces
- Particulate Contamination on Wafer Surfaces Resulting From Hexamethyldisilazane/Water Interactions
- Contamination of Chip Surfaces by Particles During Destructive Physical Analysis of Integrated Circuit Devices
- Calculation of Hamaker Coefficients for Metallic Aerosols from Extensive Optical Data
- Soiling Mechanisms and Performance of Anti-Soiling Surface Coatings
- Implications of Particulate Contamination in the Performance of Floppy Disks
- II. Particle-Substrate Interaction and Particle Adhesion
- A Theoretical Review of Particle Adhesion
- The Electrostatic Force on a Dielectric Sphere Resting on a Conducting Substrate
- Electrostatic Charge Generation on Wafer Surfaces and Its Effect on Particulate Deposition
- Toner Adhesion in Electrophotography
- Adhesion and Removal of Particles: Effect of Medium
- Strong Adhesion of Dust Particles
- Prevention of Strong Adhesion of Dust Particles
- Dynamic Adhesion of Particles Impacting a Cylinder
- Crossed Fiber Models of the Particle-Surface Interaction
- Sensitive New Method for the Determination of Adhesion Force Between a Particle and a Substrate
- III. Particle Detection, Analysis and Characterization
- Detection of Particles on Clean Surfaces
- Detection of Particles Down to a “Few” Micrometers on Non-Specular Microelectronic Substrates and Other Surfaces
- Accurate Particle Counting for Bare Substrate Inspection
- Automated SEM/EDS ImageAnalysis of Particles on Filter Blanks
- Particle Sizing and Counting with the Inspex EX20/20