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LEADER |
00616nmm a2200181 u 4500 |
001 |
EB000412130 |
003 |
EBX01000000000000000265204 |
005 |
00000000000000.0 |
007 |
cr||||||||||||||||||||| |
008 |
130930 ||| |
020 |
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|a 9780819494917
|
245 |
0 |
0 |
|a Photomask and Next-Generation Lithography Mask Technology XX
|h Elektronische Ressource
|
260 |
|
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|a Bellingham, Wash.
|b SPIE
|c 2013
|
989 |
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|b SPIE
|a SPIE Conference Proceedings
|
490 |
0 |
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|a Proceedings of SPIE
|
856 |
4 |
0 |
|u https://www.spiedigitallibrary.org/conference-proceedings-of-spie/8701
|x Verlag
|3 Volltext
|
082 |
0 |
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|a 600
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082 |
0 |
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|a 500
|