Nanoimprint Lithography: An Enabling Process for Nanofabrication
Nanoimprint Lithography: An enabling process for nanofabrication presents a comprehensive description of nanotechnology that is one of the most promising low-cost, high-throughput technologies for manufacturing nanostructures, and an emerging lithography candidates for 22, 16 and 11 nm nodes. It pro...
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| Format: | eBook |
| Language: | English |
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Berlin, Heidelberg
Springer Berlin Heidelberg
2013, 2013
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| Edition: | 1st ed. 2013 |
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| Collection: | Springer eBooks 2005- - Collection details see MPG.ReNa |
Table of Contents:
- Principles and statues of nanoimprint lithography
- Stamp Fabrication
- stamp surface treatment
- Nanoimprint lithography resists
- Nanoimprint lithography process
- Modeling and Simulation of NIL
- Application of NIL in Light emitting Diodes
- Application of NIL in memory devices
- Application of NIL in solar cell