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Gate Dielectrics and MOS ULSIs : Principles, Technologies and Applications
by
Hori, Takashi
Published 1997
Springer Berlin Heidelberg
Table of Contents:
“
...-Induced Degradation -- (c) Device Lifetime -- 5.5 Summary and Outlook -- 6. High-Dielectric
Constant
Films
...
”
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530 - Physics
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Springer Book Archives -2004
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Hori, Takashi
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