Handbook of cleaning for semiconductor manufacturing fundamentals and applications
This comprehensive volume provides an in-depth discussion of the fundamentals of cleaning and surface conditioning of semiconductor applications such as high-k/metal gate cleaning, copper/low-k cleaning, high dose implant stripping, and silicon and SiGe passivation. The theory and fundamental physic...
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| Format: | eBook |
| Language: | English |
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Salem, Mass.
John Wiley & Sons, Inc.
2011
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| Series: | Wiley-Scrivener
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| Collection: | O'Reilly - Collection details see MPG.ReNa |
| Summary: | This comprehensive volume provides an in-depth discussion of the fundamentals of cleaning and surface conditioning of semiconductor applications such as high-k/metal gate cleaning, copper/low-k cleaning, high dose implant stripping, and silicon and SiGe passivation. The theory and fundamental physics associated with wet etching and wet cleaning is reviewed, plus the surface and colloidal aspects of wet processing. Formulation development practices and methodology are presented along with the applications for preventing copper corrosion, cleaning aluminum lines, and other sensitive layers. This |
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| Physical Description: | xxii, 590 pages illustrations |
| ISBN: | 9781118099513 1118099516 1613441770 1283374595 9781283374590 1118071735 1118071743 9781118071731 9781118071748 9786613374592 0470625953 9781613441770 9780470625958 |