Electron Microbeam Analysis

This supplement of Mikrochimica Acta contains selected papers from the Second Workshop of the European Microbeam Analysis Society (EMAS) "Modern Developments and Applications in Microbeam Analysis", on which took place in May 1991 in Dubrovnik (Yugoslavia). EMAS was founded in 1987 by memb...

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Bibliographic Details
Other Authors: Boekestein, Abraham (Editor), Pavicevic, Miodrag K. (Editor)
Format: eBook
Language:English
Published: Vienna Springer Vienna 1992, 1992
Edition:1st ed. 1992
Series:Mikrochimica Acta Supplementa
Subjects:
Online Access:
Collection: Springer Book Archives -2004 - Collection details see MPG.ReNa
LEADER 05169nmm a2200349 u 4500
001 EB000708416
003 EBX01000000000000000561498
005 00000000000000.0
007 cr|||||||||||||||||||||
008 140122 ||| eng
020 |a 9783709166796 
100 1 |a Boekestein, Abraham  |e [editor] 
245 0 0 |a Electron Microbeam Analysis  |h Elektronische Ressource  |c edited by Abraham Boekestein, Miodrag K. Pavicevic 
250 |a 1st ed. 1992 
260 |a Vienna  |b Springer Vienna  |c 1992, 1992 
300 |a IX, 278 p. 35 illus  |b online resource 
505 0 |a EPMA - A Versatile Technique for the Characterization of Thin Films and Layered Structures. -- Quantitative EPMA of the Ultra-Light Elements Boron Through Oxygen. -- Auger Microscopy and Electron Probe Microanalysis. -- Quantitative X-Ray Microanalysis of Ultra-Thin Resin-Embedded Biological Samples. -- Analytical and High-Resolution Electron Microscopy Studies at Metal/Ceramic Interfaces. -- Quantitative Electron Probe Microanalysis of Multi-layer Structures. -- Comparison of ? (?z) Curve Models in EPMA. -- Quantitative Electron Probe Microanalysis: New Accurate ? (?z) Description. -- A Modular Universal Correction Procedure for Quantitative EPMA. -- Monte Carlo Simulation of Backscattered and Secondary Electron Profiles. -- An Electron Scattering Model Applied to the Determination of Film Thicknesses Using Electron Probe Microanalysis. -- Calculation of Depth Distribution Functions for Characteristic and for Continuous Radiation. --  
505 0 |a A Method for In-Situ Calibration of Semiconductor Detectors. -- Background Anomalies in Electron Probe Microanalysis Caused by Total Reflection. -- Automatic Analysis of Soft X-Ray Emission Spectra Obtained by EPMA. -- The Scanning Very-Low-Energy Electron Microscopy (SVLEEM). -- To the Backscattering Contrast in Scanning Auger Microscopy. -- Design Consideration Regarding the Use of an Accelerator on Mass Spectrometer in Ion Microanalysis. -- Accurate Estimation of Uncertainties in Quantitative Electron Energy- Loss Spectrometry. -- An EELS System for a TEM/STEM-Performance and Its Use in Materials Science. -- Quantitative X-Ray Microanalysis of Bio-Organic Bulk Specimens. -- Quantitative Analysis of (Y2O3)x (ZrO2)1-x Films on Silicon by EPMA. -- EPMA of Surface Oxide Films. -- Non-Destructive Determination of Ion-Implanted Impurity Distribution in Siliconby EPMA. -- An Electron Spectroscopy Study of a-SiNx Films. -- Electron Probe Microanalysis of Glass Fiber Optics. --  
505 0 |a Quantitative Microanalysis of Low Concentrations of Carbon In Steels. -- Electron Configuration of the Valence-Conduction Band of the Mineral Wustite. -- Structural Analysis of Silver Halide Cubic Microcrystals with Epitaxial or Conversion Growths by STEM-EDX. -- Characterization of the Bony Matrix of the Otic Capsule in Human Fetuses by EPMA. -- Overview 
653 |a Physical chemistry 
653 |a Polymers 
653 |a Analytical chemistry 
653 |a Physical Chemistry 
653 |a Analytical Chemistry 
700 1 |a Pavicevic, Miodrag K.  |e [editor] 
041 0 7 |a eng  |2 ISO 639-2 
989 |b SBA  |a Springer Book Archives -2004 
490 0 |a Mikrochimica Acta Supplementa 
028 5 0 |a 10.1007/978-3-7091-6679-6 
856 4 0 |u https://doi.org/10.1007/978-3-7091-6679-6?nosfx=y  |x Verlag  |3 Volltext 
082 0 |a 543 
520 |a This supplement of Mikrochimica Acta contains selected papers from the Second Workshop of the European Microbeam Analysis Society (EMAS) "Modern Developments and Applications in Microbeam Analysis", on which took place in May 1991 in Dubrovnik (Yugoslavia). EMAS was founded in 1987 by members from almost all European countries, in order to stimulate research, applications and development of all forms of microbeam methods. One of the most important activities EMAS is the organisation of biannual workshops for demonstrating the current status and developing trends of microbeam methods. For this meeting, EMAS chose to highlight the following topics: electron-beam microanalysis (EPMA) of thin films and quantitative analysis of ultra-light elements, Auger electron spectroscopy (AES), electron energy loss spec­ trometry (EELS), high-resolution transmission electron microscopy (HRTEM), quantitative analysis of biological samples and standard-less electron-beam microanalysis. Seven introductory lectures and almost seventy poster presentations were given by speakers from twelve European and two non-European (U.S.A. and Argentina) countries were made. One cannot assume that all fields of research in Europe were duly represented, but a definite trend is discernible. EPMA with wavelength-dispersive spectrometry (WDS) or energy-dispersive spectrometry (EDS) is the method with by far the widest range of applications, followed by TEM with EELS and then AES. There are also interesting suggestions for the further development of new appa­ ratus with new fields of application. Applications are heavily biased towards materials science (thin films in microelectronics and semicon­ ductors), ceramics and metallurgy, followed by analysis of biological and mineral samples