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140122 ||| eng |
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|a 9781489935441
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| 100 |
1 |
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|a Mittal, K.L.
|e [editor]
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| 245 |
0 |
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|a Particles in Gases and Liquids 2
|h Elektronische Ressource
|b Detection, Characterization, and Control
|c edited by K.L. Mittal
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| 246 |
3 |
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|a Proceedings of the Second Symposium on Particles in Gases and Liquids, held at the 20th Annual Meeting of the Fine Particle Society, in Boston, Massachusetts, August 21-25, 1989
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| 250 |
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|a 1st ed. 1990
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| 260 |
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|a New York, NY
|b Springer US
|c 1990, 1990
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| 300 |
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|a X, 408 p
|b online resource
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| 505 |
0 |
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|a Resolution, Sensitivity, Counting Efficiency, and Coincidence Limit of Optical Aerosol Particle Counters -- Particles in Liquids: Detection Characterization and Control -- Characterization of the Particle Loading in Deionized Water Systems by Automated SEM Analysis -- A Sensitive Monitor for Particles in Liquids -- New Techniques for Sampling Submicron Particle Contamination in Water -- Scaling Laws for Rayleigh Particle Detection in Liquids -- Removal of Particles from Deionized Water in a Recirculating Bath by Etchant Filters -- Modelling of Particle Removal from a Circulating Etch Bath -- Packaging High Purity Chemicals to Ensure Low Particulate Contamination at Point-of-Use
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| 505 |
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|a Particle Release from Surfaces by Mechanical Shocks -- Flowrate Dependence of Particle Shedding from a Gas Delivery Line -- Apparatus for Measuring Ultrafine Particle Emissions from Air Ionization Equipment -- Measurement of Submicrometer Particle Deposition on Silicon Wafers in Cleanroom Environment -- Particles in Gases: Detection, Characterization and Control -- Characterization of Individual Particles in Gaseous Media by Mass Spectrometry -- Characterization of Particles in High-Purity Gases -- Particle Measurement in Gas System Components: Defining a Practical Test Method -- Real-Time Measurement of Particulate Levels in Gases in a Production Diffusion Environment -- In-Situ Particle Monitoring in a Plasma Etcher -- Protected Particle Collection from Gas Streams for Characterization by Analytical Electron Microscopy -- Photoacoustic Detection of Radiation Absorbing Particles in Gases -- Transport of Charged Particles in Gas Streams --
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| 505 |
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|a General Overview Papers -- Modeling of Particle Deposition in Cleanroom Environments: Current Status -- Sampling of Airborne Particles for Contamination Assessment -- The Role of Bacterial Biofilms in Contamination of Process Fluids by Biological Particulates -- Describing Filters and Filtration Processes Using the Concepts of Fractal Geometry -- Detection and Control of Particles in Vacuum Environments for Semiconductor Processing -- Operator-Generated Particles: Characterization, Monitoring and Control -- Building and Using an Application-Specific Particle Atlas -- Particulate Cleanliness Testing of Filters and Equipment in Process Fluids (Gas or Liquid) -- Optical Particle Counter Performance Definitions Effects on Submicrometer Particle Measurement -- Particle Generation and Deposition -- Assessing Wiping Materials for their Potential to Contribute Particles to Clean Environments: A Novel Approach -- Robots as a Potential Source of Particulate Contamination --
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| 653 |
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|a Physical chemistry
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| 653 |
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|a Physical Chemistry
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| 041 |
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7 |
|a eng
|2 ISO 639-2
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| 989 |
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|b SBA
|a Springer Book Archives -2004
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| 856 |
4 |
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|u https://doi.org/10.1007/978-1-4899-3544-1?nosfx=y
|x Verlag
|3 Volltext
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| 082 |
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|a 541
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| 520 |
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|a This book chronicles the proceedings of the Second Symposium on Particles in Gases and Liquids: Detection, Characterization and Control held as a part of the 20th Annual Fine Particle Society meeting in Boston, August 21-25, 1989. As this second symposium was as successful as the prior one, so we have decided to hold symposia on this topic on a regular (biennial) basis and the third symposium in this series is scheduled to be held at the 22nd Annual Meeting of the Fine Particle Society in San Jose, California, July 29-August 2, 1991. l As pointed out in the Preface to the prior volume in this series that recently there has been tremendous concern about yield losses due to unwanted particles, and these unwelcome particles can originate from a legion of sources, including process gases and liquids. Also all signals indicate that in the future manufacture of sophisticated and sensitive microelectronic components (with shrinking dimensions) and other precision parts, the need for detection, characterization, analysis and control of smaller and smaller particles will be more intensified
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