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1999 4th International Symposium on Plasma Process-Induced Damage (IEEE Cat. No.99TH8395)

Bibliographic Details
Format: eBook
Published: New York The Institute of Electrical and Electronics Engineers, Inc. 1999
Subjects:
Engineered Materials, Dielectrics And Plasmas; Fields, Waves And Electromagnetics; Components, Circuits, Devices And Systems; Power, Energy And Industry Applications; Nuclear Engineering
Online Access:
https://ieeexplore.ieee.org/servlet/opac?punumber=...
Collection: IEEE Conference Proceedings - Collection details see MPG.ReNa
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ISBN:0965157733

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